Gabriela Dilliway
Dr. Gabriela Dilliway is a distinguished leader in semiconductor research and development, with over 25 years of experience driving innovation in CMOS logic technology. As a Principal Researcher at Natcast, she spearheaded strategic initiatives to accelerate innovation in CMOS device performance and scaling. Her vision was instrumental in building ecosystems to accelerate the lab-to-fab transition for early industry adoption of novel materials and processes, including low-dimensional materials.
Prior to Natcast, Dr. Dilliway had key roles in logic pathfinding and R&D at Intel, GlobalFoundries and IMEC where she made significant contributions to multiple CMOS technology nodes and transistor architectures, including FinFET and gate-all-around nanoribbons (GAA-NRs). With over 40 publications and several patents and trade secrets in high-volume manufacturing, Dr. Dilliway is recognized globally for her technical excellence and visionary approach.
Dr. Dilliway holds a PhD in Engineering Materials from the University of Southampton, UK, and Master’s and Bachelor’s Degrees in Physics from the University of Bucharest, Romania.
Dr. Dilliway continues to shape the future of semiconductor technology at SemiTech Insights through her commitment to innovation, collaboration, and scalable solutions.
Areas of Expertise: Expert in advanced CMOS logic device architecture: CFET, gate-all-around nanoribbons (GAA-NR), FinFET and non-volatile memory (NVM): 3DXP integration, ALD, high-k metal gate, epitaxy of Si and Ge-based materials, novel (low-dimensional) materials, physical characterization